Automatic Matching Network (3KV)
Automatic Matching Network (3KV) for RF plasma control adjusts the RF-generated impedance of the plasma chamber to 50 ohms, maximizing power transfer from the generator to the chamber. This automatic matching network operates in three distinct modes.
In automatic mode, the system continuously compensates for impedance variations within the plasma enclosure.
Manual mode allows the operator to adjust the matching capacitance values during operation.
In preset mode, the operator can set capacitance values near optimal matching conditions at the start, enabling faster matching. Various parameters can be adjusted and monitored through the front panel of the control system, with VGA connections for enhanced display capabilities.
This device is particularly effective for plasma production in a variety of applications, including different stages of deposition (cleaning, etching, sputtering, etc.) and the fabrication of microelectronic components in the field of nanotechnology.
The automatic matching network provides seamless adjustment across a wide range of impedances, ensuring optimal performance for RF plasma applications. It includes comprehensive control and display for all parameters, along with full remote control capability.
Users can select from three operational modes: manual, automatic, and preset. The digital display shows capacitor locations and provides alarms for capacitor limitations. In manual mode, operators can precisely adjust capacitor locations using a digital rotary encoder located on the control panel.
The unit control box is designed for easy rack installation, while a separate match box can be installed near the plasma enclosure for effective operation. The system also features reserve capacitor sets and inductor change tabs, which expand the load impedance range. Adequate shielding is included to prevent radiation and EMI noise, ensuring a safe working environment for the operator.
| ATN03VT | |
| Applied Power | 220 (200-240) V, 50 (50-60) Hz (110V is also available) |
| Maximum Input Power | 300 W for standard load such as sputtering gun (limited to voltage 3KV and current 10 A) |
| Frequency (MHz) | 13.56 |
| Band width | 5% |
| Matching network controlling connector | VGA |
| Working modes | Manual, Automatic, Preset |
| Matching speed | Depending on the load conditions between 5 and 30 seconds and when following the matching point is less than 5 seconds. |
| Controller characteristics | when capacitors reach to the beginning and end, an alarm will be activated. It has two steps (quick and accurate) for the tuning the location of capacitors. It has a digital display of the location of capacitors. It has a LED to show the mode. It has a screw in priest mode to adjust capacitors location. adjustable gain of control loop for achieving optimal speed and stability |
| Circuit topology | L Network |
| Voltage-Current-Capacity of Capacitors | 3KV-10A-150PF |
| Output impedance | A wide range.It performs matching for the standard sputtering cathode to a wide range. |
| Working temperature | 10-40 C |
| Cooling | Air-cooled via Fan |
| Input Connector | Female N |
| Output connector | Output Female N |
| Dimension | 13*41*17 (length*width*height) |
| Weight | about 4 Kg |
| Box Material | Aluminium |
Controller specifications
| Matching network controlling connector | VGA |
| Adjusting Capacitors | In three modes: Manual, Automatic, Preset |
| Displays and outputs | A panel to display online location of capacitors. Automatic deactivator of the device in the event of capacitors reaching first or end. Analog output to show the impedance domain and phase. |
| On/Off switch | A button in the front panel of the device control box. The device has two parts. A box for impedance matching and a small box to control the system display. |
| Dimensions (cm) | 4.4*22*23 (length*width*height) |
| Weight | 1 Kg |
| Box material | Aluminium |
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