RF Radio Frequency Plasma Generators
RF Radio Frequency Plasma Generators create controlled plasma, ideal for semiconductor manufacturing and material processing. These devices offer precise ionization control, which ensures uniform surface modifications essential for processes like thin-film deposition and plasma etching.
Product Categories
RF Plasma Generator 100W-300W
RF Plasma Generator 100W-300W is highly reliable for industrial and laboratory applications, including deposition, plasma generation, dielectric heating...
RF Plasma Generator 300W-600W
RF Plasma Generator 300W-600W designed for sputtering and plasma applications are trusted tools for industrial and laboratory processes, such as deposition...
Automatic Matching Network (25KV)
Automatic Matching Network (25KV) control adjusts the RF-generated impedance of the plasma chamber to 50 ohms, ensuring maximum power transfer from the generator to the chamber...
Automatic Matching Network (3KV)
Automatic Matching Network (3KV) for RF plasma control adjusts the RF-generated impedance of the plasma chamber to 50 ohms, maximizing power transfer from the generator to the chamber...
Automatic Matching Network (15KV)
Automatic Matching Network (15KV) for RF plasma control adjusts the RF-generated impedance of the plasma chamber to 50 ohms, maximizing power transfer from the generator to the chamber...
Auto/Manual Tune and Control
RF matching networks, available with both automatic and manual tuning capabilities, are engineered to integrate seamlessly with RF generators, maintaining an...
Sputtering RF and DC Magnetrons
Sputtering, a widely-used process in thin film deposition, includes specialized techniques ideal for various materials and substrate requirements...
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